CAS No.: | 112945-52-5 |
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Formula: | Sio2 |
EINECS: | 12945-52-5 |
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Model Technical indicators |
G-01 | G-03 | G-06 | G-08 | G-10 |
SiO2(%) | 10+0.5% | 30+0.5% | 30+0.5% | 30+0.5% | 30+0.5% |
Na+,K+(ppm) | ≤40 | ≤100 | ≤100 | ≤100 | ≤100 |
PH(1%,25ºC) | 2-4 | 8.5-9.5 | 9-10 | 9.5-10.5 | 10-11 |
Average particle size(nm) | 8-10 | 20-40 | 50-70 | 70-90 | 90-120 |
Specific Gravity(g/cm3) | 1.07-1.10 | 1.19-1.21 | 1.19-1.21 | 1.19-1.21 | 1.19-1.21 |
Viscosity (cp) |
≤4 | ≤7 | ≤7 | ≤7 | ≤7 |
Color | Translucent blue | Translucent blue | Cream | Cream | Cream |
Usage | Fine polishing of optical glass | Fine polishing of semiconductor | Fine polishing solution of sapphire | Fine polishing solution of sapphire | Precision Metal |
Model of polishing powder
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TREO(%)
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Main technical parametersCeO/TREO(%)
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F(%)
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D50(um)
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Application
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E05
|
92
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80
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2-3
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0.4-0.6
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Applicable to the fine polishing of quartz, glass ceramic, BK7 and fused silica.
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E08
|
92
|
80
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2-3
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0.6-0.9
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Suitable for final polishing process of HDand various optical components.
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E10
|
92
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80
|
2-3
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1.1-1.4
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Suitable for the first polishing process of TFT, HD andvarious soft glass lenses. With corresponding effect on t E303 and TE-98.
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E20
|
90
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75-80
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3-5
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1.8-2.1
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It is a kind of general polishing powder with features of fast polishing and wide range of application, suitable for processing parts in medium precision, as well as for the polishing of flat or spherical hard materials.
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E30
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90
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75-80
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3-5
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2.8-3.3
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As a product designed and developed for customers with high cost performance, it is a polishing powder with high amount , suitable for polishing process of mobile phone cover and quartz glass.
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E40
|
90
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75
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3-5
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3.8-4.3
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It is suitable for hard materials, in particular, the polishing of the glass with degree of abrasion between 40-60.
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Recommended concentration of polishing powder (solution): About 50 to 120 g/l (concentration should not be too high).
Polishing temperature:20 ~ 30 ºC.
Material of polishing pad:Suiting for various polishing materials ,such as polyurethane polished section, black polishing pad, asphalt, blankets, synthetic leather ,etc.
Feature:
1. Good surface quality after polishing.
2. Applicable to various methods of processing.
3. Available for polishing a variety of parts.
4. High efficiency, low viscosity and easy to clean.
5. Good suspension.
6. Long service life.
Technical parameter:
Color: Light brownish red
Average particle size: 0.4-0.5μm
PH value: 8.5-9.5
Usage:
1.Precise optical components in field.
2. Components of laser electron.
3. Various parts of the scientific instruments.
4. Cameras, projectors and a variety of telescopes.
5. LCD surface and disc.
6. Other precise optical components.
Recommended polishing concentration:
The polishing agent is a concentrated solution with concentration of 400 g/l.It is suggested to shake the polishing solution well and completely before using and then to dilute it in proportion. Final dilution shall be decided in accordance with your requirements.
Polishing pad material:
Suitable for a variety of polishing materials, such as polyurethane polished section, black polishing pad, asphalt, blankets and synthetic leather.
Packing: 20kg / barrel
Polishing powder: 20kg /barrel.
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